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Company History

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  • 2000년도
    • Aug 2000Development of coating method with UV device
    • Feb 2001Development of equipment of plasma etching system
    • Jun 2003Patent application for concurrent coating equipment for both sides with vacuum deposition
    • Jan 2004Production and installation of multi coating machine (Mobile phone window and lens)
    • July 2004Development, production and installation of equipment for dual system for sputtering system+beam power
    • Oct 2004Development of multi coating on the metal parts for external decoration of mobile phone (SUS and magnesium)
    • Aug 2006Establishment of S.I. Tech Co., Ltd
    • Feb 2009Establishment of S.I.T.
    • Sep 2009Production of in-line sputtering machine (Exclusive use for ITO and Touch)
    • Feb 2010Establishment of S.I.T Electronic Corporation in Donguan, China
  • 1990년도
    • Nov 1991Establishment of Korea Ion Plating Co., Ltd
    • Jan 1992Development of high vacuum multi layer coating system
    • Aug 1998Development of dual system for sputtering and EVA
    • Mar 1999Development of coating method for blocking the mobile phone electromagnetic wave
    • Jun 1999Approval and delivery of the product developed in the T.M.C(NOKIA) factory of Korea